- PRODUCT
- ULFA Technology
/ PRODUCT / MEMBRANE / CHEMICAL
RECOS – Ungluing preparations for photo resist
The RECOS photo resist removal agent is safer and more environmentally friendly than other amine-solvent mixtures.
Degrated RECOS with melted photo resist can be regenerated by ozone. Also recycling device can be installed with wet system.
Advantages of RECOS
There is almost no damage inflicted on metal film.
In addition, RECOS can be recycled by ozone so that you are able to reduce organic wastes.
- Fields of possible use and potential application
- Lift-off device
- - There is almost no damage inflicted on metal film. In addition, device recycle possibility results in lesser amounts of organic waste.
- Coater cup solvent cleaner.
- Effectively removes smudges from coater cups. Recycled ozone reacts with photo resist, decomposing it and positively affecting the solvent’s longevity.
- Photo resist films removal agent
- - RECOS photo resist solution is safer than existing photo resist strippers. It also provides recycle possibility.
- Photo resist films removal agent for liquid crystal production
- - There is almost no damage inflicted on metal film. In addition, device recycle possibility results in lesser amounts of organic waste and lowers the maintenance expenses.
- AC-1
- - Antistatic agent for liquid crystal glass circuit boards
- AC-1 series is a product with designed to enhance the outdated charging liquid crystal production processes.
AC-1 has dramatically improved yield rate of LCD products, especially the TFT LCD production line, and now is widely used by many other electronic industries.